Semiconductor Engineering sat down to discuss lithography and photomask technologies with Greg McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...
At next week’s SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line ...
Directed self-assembly (DSA) is moving back onto the patterning radar screen amid ongoing challenges in lithography. Intel continues to have a keen interest in DSA, while other chipmakers are taking ...
ACS Nano – Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist paper from June, 2010 is an example of some of the work on ...
Today, at SPIE Advanced Lithography Conference (San Jose, Feb 21-25), world-leading nanoelectronics research center imec will present electrical results of DSA (directed self-assembly)-formed vias, ...
A new paper claims that directed self-assembly could be key to patterning lines below 10nm, but line-edge roughness and manufacturing challenges still present substantial barriers. Share on Facebook ...
ALBANY, N.Y. & KYOTO, Japan--(BUSINESS WIRE)--Dainippon Screen Mfg. has confirmed our subsidiary company’s SOKUDO DUO 450mm coat/develop track system has been chosen by the Global 450mm Consortium ...
(Nanowerk News) Last week’s SPIE Advanced Lithography was a success in both quality of papers and numbers of attendees , with attendance at 2,230 and important progress reports on extreme ultraviolet ...
GRENOBLE, France--(BUSINESS WIRE)--CEA-Leti said today that its multi-partner programs, IDEAL and IMAGINE, have demonstrated cost-effective solutions that extend 193nm immersion lithography for 1X ...
GRENOBLE, FRANCE: CEA-Leti said that its multi-partner programs, Ideal and Imagine, have demonstrated cost-effective solutions that extend 193nm immersion lithography for 1X nodes for critical levels ...
(Nanowerk News) At next week's SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world's first 300mm fab-compatible Directed Self-Assembly (DSA) ...
At next week’s SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results